Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Schottky Barrier Characteristics of 3C-SiC Epilayers Grown by Low Pressure Chemical Vapor Deposition
Schottky Barrier Characteristics of 3C-SiC Epilayers Grown by Low Pressure Chemical Vapor Deposition
Schottky Barrier Characteristics of 3C-SiC Epilayers Grown by Low Pressure Chemical Vapor Deposition
Ishida, Y. (Autor:in) / Takahashi, T. (Autor:in) / Okumura, H. (Autor:in) / Sekigawa, T. (Autor:in) / Yoshida, S. (Autor:in)
MATERIALS SCIENCE FORUM ; 338/342 ; 1235-1238
01.01.2000
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Thermal stability of InN epilayers grown by high pressure chemical vapor deposition
British Library Online Contents | 2013
|British Library Online Contents | 2002
|Low Resistivity, Thick Heavily Al-Doped 4H-SiC Epilayers Grown by Hot-Wall Chemical Vapor Deposition
British Library Online Contents | 2013
|British Library Online Contents | 2000
|British Library Online Contents | 2009
|