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3-D Thermal and Flow Modeling of Hot Wall Epitaxial Chemical Vapor Deposition Reactors, Heated by Induction
3-D Thermal and Flow Modeling of Hot Wall Epitaxial Chemical Vapor Deposition Reactors, Heated by Induction
3-D Thermal and Flow Modeling of Hot Wall Epitaxial Chemical Vapor Deposition Reactors, Heated by Induction
Lofgren, P. M. (Autor:in) / Hallin, C. (Autor:in) / Gu, C.-Y. (Autor:in) / Ji, W. (Autor:in)
MATERIALS SCIENCE FORUM ; 338/342 ; 153-156
01.01.2000
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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