Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si: Fid-Bau Portal

Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si

Wang, Y. / Lin, J. / Feng, Z. C. / Chua, S. J. / Alfred, C. H. H.

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Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si

Wang, Y. / Lin, J. / Feng, Z. C. / Chua, S. J. / Alfred, C. H. H.

Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si

Wang, Y. / Lin, J. / Feng, Z. C. / Chua, S. J. / Alfred, C. H. H.

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Check availability in my library

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Document information

Title:

Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si

Contributors:

Wang, Y. (author) / Lin, J. (author) / Feng, Z. C. (author) / Chua, S. J. (author) / Alfred, C. H. H. (author)

Published in:

MATERIALS SCIENCE FORUM ; 338/342 ; 325-328

Publication date:

2000-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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