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Laser Doping and Recrystallization for Amorphous Silicon Films by Plasma-Enhanced Chemical Vapor Deposition
Laser Doping and Recrystallization for Amorphous Silicon Films by Plasma-Enhanced Chemical Vapor Deposition
Laser Doping and Recrystallization for Amorphous Silicon Films by Plasma-Enhanced Chemical Vapor Deposition
Wuu, D. S. (Autor:in) / Lien, S. Y. (Autor:in) / Wang, J. H. (Autor:in) / Mao, H. Y. (Autor:in) / Hsieh, I. C. (Autor:in) / Wu, B. R. (Autor:in) / Yao, P. C. (Autor:in)
MATERIALS SCIENCE FORUM ; 475/479 ; 3791-3794
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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