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Epitaxial growth of 3C-SiC films on Si substrates by triode plasma CVD using dimethylsilane
Epitaxial growth of 3C-SiC films on Si substrates by triode plasma CVD using dimethylsilane
Epitaxial growth of 3C-SiC films on Si substrates by triode plasma CVD using dimethylsilane
Yasui, K. (Autor:in) / Asada, K. (Autor:in) / Akahane, T. (Autor:in)
APPLIED SURFACE SCIENCE ; 159-160 ; 556-560
01.01.2000
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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