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Epitaxial growth of 3C-SiC films on Si substrates by triode plasma CVD using dimethylsilane
Epitaxial growth of 3C-SiC films on Si substrates by triode plasma CVD using dimethylsilane
Epitaxial growth of 3C-SiC films on Si substrates by triode plasma CVD using dimethylsilane
Yasui, K. (author) / Asada, K. (author) / Akahane, T. (author)
APPLIED SURFACE SCIENCE ; 159-160 ; 556-560
2000-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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