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Epitaxial Growth of 4H-SiC in a Vertical Hot-Wall CVD Reactor: Comparison between Up- and Down-Flow Orientations
Epitaxial Growth of 4H-SiC in a Vertical Hot-Wall CVD Reactor: Comparison between Up- and Down-Flow Orientations
Epitaxial Growth of 4H-SiC in a Vertical Hot-Wall CVD Reactor: Comparison between Up- and Down-Flow Orientations
Zhang, J. (Autor:in) / Ellison, A. (Autor:in) / Danielsson, O. (Autor:in) / Henry, A. (Autor:in) / Janzen, E. (Autor:in)
MATERIALS SCIENCE FORUM ; 353/356 ; 91-94
01.01.2001
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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