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RBS-channeling studies on damage production by MeV ion implantation in Si(111) wafers
RBS-channeling studies on damage production by MeV ion implantation in Si(111) wafers
RBS-channeling studies on damage production by MeV ion implantation in Si(111) wafers
Cheang-Wong, J. C. (Autor:in) / Crespo-Sosa, A. (Autor:in) / Oliver, A. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 84 ; 205 - 210
01.01.2001
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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