RBS-channeling studies on damage production by MeV ion implantation in Si(111) wafers: Fid-Bau Portal

RBS-channeling studies on damage production by MeV ion implantation in Si(111) wafers

Cheang-Wong, J. C. / Crespo-Sosa, A. / Oliver, A.

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RBS-channeling studies on damage production by MeV ion implantation in Si(111) wafers

Cheang-Wong, J. C. / Crespo-Sosa, A. / Oliver, A.

RBS-channeling studies on damage production by MeV ion implantation in Si(111) wafers

Cheang-Wong, J. C. / Crespo-Sosa, A. / Oliver, A.

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Order at Subito €

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Document information

Title:

RBS-channeling studies on damage production by MeV ion implantation in Si(111) wafers

Contributors:

Cheang-Wong, J. C. (author) / Crespo-Sosa, A. (author) / Oliver, A. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 84 ; 205 - 210

Publication date:

2001-01-01

Size:

6 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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