Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Low temperature epitaxial silicon films deposited by ion-assisted deposition
Low temperature epitaxial silicon films deposited by ion-assisted deposition
Low temperature epitaxial silicon films deposited by ion-assisted deposition
Wagner, T. A. (Autor:in) / Oberbeck, L. (Autor:in) / Bergmann, R. B. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 89 ; 319 - 322
01.01.2002
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
| British Library Online Contents | 2011
Low temperature, high growth rate epitaxial silicon and silicon germanium alloy films
| British Library Online Contents | 2004
Effect of deposition temperature on spray deposited cadmium oxide films
| British Library Online Contents | 2001
Epitaxial Deposition of Silicon Carbide Films in a Horizontal Hot-Wall CVD Reactor
| British Library Online Contents | 2005
Epitaxial ZnO films grown by RF-assisted low-temperature CVD method
| British Library Online Contents | 2003