The optoelectronic properties of silicon films deposited by inductively coupled plasma CVD

Qin, Y. / Yan, H. / Li, F. et al. | British Library Online Contents | 2010

Low temperature SiNx:H films deposited by inductively coupled plasma for solar cell applications

Zhou, H. P. / Wei, D. Y. / Xu, L. X. et al. | British Library Online Contents | 2013

Composition, oxidation, and optical properties of fluorinated silicon nitride film by inductively coupled plasma enhanced chemical vapor deposition

Jun, B.-H. / Joon Sing Lee / Kim, D.-W. et al. | British Library Online Contents | 1999

Inductively coupled plasma - plasma enhanced chemical vapor deposition silicon nitride for passivation of InP based high electron mobility transistors (HEMTs)

Medjdoub, M. / Courant, J. L. / Maher, H. et al. | British Library Online Contents | 2001

Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature

Wang, X. Q. / He, D. Y. / Li, J. S. | British Library Online Contents | 2007