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Low temperature epitaxial silicon films deposited by ion-assisted deposition
Low temperature epitaxial silicon films deposited by ion-assisted deposition
Low temperature epitaxial silicon films deposited by ion-assisted deposition
Wagner, T. A. (author) / Oberbeck, L. (author) / Bergmann, R. B. (author)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 89 ; 319 - 322
2002-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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