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Epitaxial Deposition of Silicon Carbide Films in a Horizontal Hot-Wall CVD Reactor
Epitaxial Deposition of Silicon Carbide Films in a Horizontal Hot-Wall CVD Reactor
Epitaxial Deposition of Silicon Carbide Films in a Horizontal Hot-Wall CVD Reactor
Veneroni, A. (Autor:in) / Omarini, F. (Autor:in) / Masi, M. (Autor:in) / Leone, S. (Autor:in) / Mauceri, M. (Autor:in) / Pistone, G. (Autor:in) / Abbondanza, G. (Autor:in) / Nipoti, R. / Poggi, A. / Scorzoni, A.
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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