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Effect of patterning on thermal agglomeration of ultrathin silicon-on-insulator layer
Effect of patterning on thermal agglomeration of ultrathin silicon-on-insulator layer
Effect of patterning on thermal agglomeration of ultrathin silicon-on-insulator layer
Ishikawa, Y. (Autor:in) / Kumezawa, M. (Autor:in) / Nuryadi, R. (Autor:in) / Tabe, M. (Autor:in)
APPLIED SURFACE SCIENCE ; 190 ; 11-15
01.01.2002
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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