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SIMS depth profile of copper in low-k dielectrics under electron irradiation for charge compensation
SIMS depth profile of copper in low-k dielectrics under electron irradiation for charge compensation
SIMS depth profile of copper in low-k dielectrics under electron irradiation for charge compensation
Yamada, K. (Autor:in) / Fujiyama, N. (Autor:in) / Sameshima, J. (Autor:in) / Kamoto, R. (Autor:in) / Karen, A. (Autor:in)
APPLIED SURFACE SCIENCE ; 203-204 ; 512-515
01.01.2003
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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