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Ti diffusion in chalcogenides: a ToF-SIMS depth profile characterization approach
Ti diffusion in chalcogenides: a ToF-SIMS depth profile characterization approach
Ti diffusion in chalcogenides: a ToF-SIMS depth profile characterization approach
Alberici, S. G. (Autor:in) / Zonca, R. (Autor:in) / Pashmakov, B. (Autor:in)
APPLIED SURFACE SCIENCE ; 231/232 ; 821-825
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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