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    SIMS depth profile of copper in low-k dielectrics under electron irradiation for charge compensation

    New search for: Yamada, K.
    New search for: Fujiyama, N.
    New search for: Sameshima, J.
    New search for: Kamoto, R.
    New search for: Karen, A.

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    SIMS depth profile of copper in low-k dielectrics under electron irradiation for charge compensation

    New search for: Yamada, K.
    New search for: Fujiyama, N.
    New search for: Sameshima, J.
    New search for: Kamoto, R.
    New search for: Karen, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    SIMS depth profile of copper in low-k dielectrics under electron irradiation for charge compensation

    New search for: Yamada, K.
    New search for: Fujiyama, N.
    New search for: Sameshima, J.
    New search for: Kamoto, R.
    New search for: Karen, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    SIMS depth profile of copper in low-k dielectrics under electron irradiation for charge compensation

    Contributors:

    Yamada, K. (author) / Fujiyama, N. (author) / Sameshima, J. (author) / Kamoto, R. (author) / Karen, A. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 203-204 ; 512-515

    Publication date:

    2003-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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