Modeling effect of chemical-mechanical synergy on material removal at molecular scale in chemical mechanical polishing

Wang, Y. / Zhao, Y. / Jiang, J. et al. | British Library Online Contents | 2008

A Material Removal Modeling of Chemical Mechanical Polishing Based on Micro-Contact Mechanism

Du, S.W. / Li, Y.T. / Song, J.J. et al. | British Library Online Contents | 2011

Modeling and Analyzing on Nonuniformity of Material Removal in Chemical Mechanical Polishing of Silicon Wafer

Su, J. X. / Guo, D. M. / Kang, R. K. et al. | British Library Online Contents | 2004

Modeling of Polishing Pad Wear in Chemical Mechanical Polishing

Li, M. / Zhu, Y.W. / Li, J. et al. | British Library Online Contents | 2010

An Analyzing on Material Removal Mechanism in Chemical Mechanical Polishing of Cu

Su, J.X. / Zhang, Y.X. / Chen, X.Q. et al. | British Library Online Contents | 2009