A mathematical model for material removal and chemical-mechanical synergy in chemical-mechanical polishing at molecular scale

Bai, J. / Zhao, Y. W. / Wang, Y. G. | British Library Online Contents | 2007

Multiscale material removal modeling of chemical mechanical polishing

Seok, J. / Sukam, C. P. / Kim, A. T. et al. | British Library Online Contents | 2003

Modeling effects of abrasive particle size and concentration on material removal at molecular scale in chemical mechanical polishing

Wang, Y. / Zhao, Y. / An, W. et al. | British Library Online Contents | 2010

A Material Removal Modeling of Chemical Mechanical Polishing Based on Micro-Contact Mechanism

Du, S.W. / Li, Y.T. / Song, J.J. et al. | British Library Online Contents | 2011

Modeling of Polishing Pad Wear in Chemical Mechanical Polishing

Li, M. / Zhu, Y.W. / Li, J. et al. | British Library Online Contents | 2010