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Electrical characterization of low temperature deposited TiO2 films on strained-SiGe layers
Electrical characterization of low temperature deposited TiO2 films on strained-SiGe layers
Electrical characterization of low temperature deposited TiO2 films on strained-SiGe layers
Dalapati, G. K. (Autor:in) / Chatterjee, S. (Autor:in) / Samanta, S. K. (Autor:in) / Maiti, C. K. (Autor:in)
APPLIED SURFACE SCIENCE ; 210 ; 249-254
01.01.2003
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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