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Characterization of As+ ion-implanted layers in strained-Si/SiGe/Si hetero-structures
Characterization of As+ ion-implanted layers in strained-Si/SiGe/Si hetero-structures
Characterization of As+ ion-implanted layers in strained-Si/SiGe/Si hetero-structures
Ishida, T. (Autor:in) / Irieda, S. (Autor:in) / Inada, T. (Autor:in) / Sugii, N. (Autor:in)
APPLIED SURFACE SCIENCE ; 224 ; 82-86
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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