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Depth Dependence of Defects in Ion-Implanted Si Probed by a Positron Beam
Depth Dependence of Defects in Ion-Implanted Si Probed by a Positron Beam
Depth Dependence of Defects in Ion-Implanted Si Probed by a Positron Beam
Fujinami, M. (Autor:in) / Miyagoe, T. (Autor:in) / Sawada, T. (Autor:in) / Suzuki, R. (Autor:in) / Ohdaira, T. (Autor:in) / Akahane, T. (Autor:in)
MATERIALS SCIENCE FORUM ; 445/446 ; 78-80
01.01.2004
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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