A platform for research: civil engineering, architecture and urbanism
Depth Dependence of Defects in Ion-Implanted Si Probed by a Positron Beam
Depth Dependence of Defects in Ion-Implanted Si Probed by a Positron Beam
Depth Dependence of Defects in Ion-Implanted Si Probed by a Positron Beam
Fujinami, M. (author) / Miyagoe, T. (author) / Sawada, T. (author) / Suzuki, R. (author) / Ohdaira, T. (author) / Akahane, T. (author)
MATERIALS SCIENCE FORUM ; 445/446 ; 78-80
2004-01-01
3 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Defect Property in He^+ Implanted Silicon Probed by Slow Positron Beam
British Library Online Contents | 2001
|Depth profiling of defects in nitrogen implanted silicon using a slow positron beam
British Library Online Contents | 1999
|Positron Beam Study of Defects Induced in Ar-Implanted Si
British Library Online Contents | 2004
|Structural defects in SiO2/SiC interface probed by a slow positron beam
British Library Online Contents | 2005
|Vacancy-Type Defects in SrTiO~3 Probed by a Monoenergetic Positron Beam
British Library Online Contents | 2004
|