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Fabrication of SiGe-on-insulator by rapid thermal annealing of Ge on Si-on-insulator substrate
Fabrication of SiGe-on-insulator by rapid thermal annealing of Ge on Si-on-insulator substrate
Fabrication of SiGe-on-insulator by rapid thermal annealing of Ge on Si-on-insulator substrate
Kutsukake, K. (Autor:in) / Usami, N. (Autor:in) / Fujiwara, K. (Autor:in) / Ujihara, T. (Autor:in) / Sazaki, G. (Autor:in) / Nakajima, K. (Autor:in) / Zhang, B. (Autor:in) / Segawa, Y. (Autor:in)
APPLIED SURFACE SCIENCE ; 224 ; 95-98
01.01.2004
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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