Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Numerical simulation of nanoparticle-generating electronegative plasmas in the PECVD of nanostructured silicon film
Numerical simulation of nanoparticle-generating electronegative plasmas in the PECVD of nanostructured silicon film
Numerical simulation of nanoparticle-generating electronegative plasmas in the PECVD of nanostructured silicon film
Denysenko, I. (Autor:in) / Ostrikov, K. (Autor:in) / Rutkevych, P. P. (Autor:in) / Xu, S. (Autor:in)
COMPUTATIONAL MATERIALS SCIENCE. ; 30 ; 303-307
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Thermal ionization and electronegative species
Engineering Index Backfile | 1964
|Crystallization Mechanism of Si Film by PECVD
British Library Online Contents | 2013
|PECVD of Silicon Dioxide from TEOS/Oxygen Mixtures
British Library Online Contents | 1993
|Neural network modeling of PECVD silicon nitride films
British Library Online Contents | 1999
|Fabrication of PECVD-silicon oxynitride-based optical waveguides
British Library Online Contents | 2004
|