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Effects of growth sequence on atomic level interfacial structures and characteristics of GaInP/GaAs/GaInP double heterostructures grown by low-pressure organometallic vapor phase epitaxy
Effects of growth sequence on atomic level interfacial structures and characteristics of GaInP/GaAs/GaInP double heterostructures grown by low-pressure organometallic vapor phase epitaxy
Effects of growth sequence on atomic level interfacial structures and characteristics of GaInP/GaAs/GaInP double heterostructures grown by low-pressure organometallic vapor phase epitaxy
Yoshikane, T. (Autor:in) / Urakami, A. (Autor:in) / Koizumi, A. (Autor:in) / Hisadome, S. (Autor:in) / Tabuchi, M. (Autor:in) / Inoue, K. (Autor:in) / Fujiwara, Y. (Autor:in) / Takeda, Y. (Autor:in)
APPLIED SURFACE SCIENCE ; 237 ; 246-250
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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