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Pressure controlled surface roughness of SiC plasma etching
Pressure controlled surface roughness of SiC plasma etching
Pressure controlled surface roughness of SiC plasma etching
Kim, B. (Autor:in) / Lee, B.-T. (Autor:in)
SURFACE ENGINEERING -LONDON- ; 20 ; 391-395
01.01.2004
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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