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Assessment of interface roughness during plasma etching through the use of real-time ellipsometry
Assessment of interface roughness during plasma etching through the use of real-time ellipsometry
Assessment of interface roughness during plasma etching through the use of real-time ellipsometry
Han, C. Y. (Autor:in) / Lai, C. W. (Autor:in) / Chao, Y. F. (Autor:in) / Leou, K. C. (Autor:in) / Lin, T. L. (Autor:in)
APPLIED SURFACE SCIENCE ; 257 ; 2536-2539
01.01.2011
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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