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Pressure controlled surface roughness of SiC plasma etching
Pressure controlled surface roughness of SiC plasma etching
Pressure controlled surface roughness of SiC plasma etching
Kim, B. (author) / Lee, B.-T. (author)
SURFACE ENGINEERING -LONDON- ; 20 ; 391-395
2004-01-01
5 pages
Article (Journal)
English
DDC:
620.44
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