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    Ultra-shallow junctions produced by plasma doping and flash lamp annealing

    New search for: Skorupa, W.
    New search for: Yankov, R. A.
    New search for: Anwand, W.
    New search for: Voelskow, M.
    New search for: Gebel, T.
    New search for: Downey, D. F.
    New search for: Arevalo, E. A.

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    Ultra-shallow junctions produced by plasma doping and flash lamp annealing

    New search for: Skorupa, W.
    New search for: Yankov, R. A.
    New search for: Anwand, W.
    New search for: Voelskow, M.
    New search for: Gebel, T.
    New search for: Downey, D. F.
    New search for: Arevalo, E. A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Ultra-shallow junctions produced by plasma doping and flash lamp annealing

    New search for: Skorupa, W.
    New search for: Yankov, R. A.
    New search for: Anwand, W.
    New search for: Voelskow, M.
    New search for: Gebel, T.
    New search for: Downey, D. F.
    New search for: Arevalo, E. A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    Ultra-shallow junctions produced by plasma doping and flash lamp annealing

    Contributors:

    Skorupa, W. (author) / Yankov, R. A. (author) / Anwand, W. (author) / Voelskow, M. (author) / Gebel, T. (author) / Downey, D. F. (author) / Arevalo, E. A. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 114/115 ; 358-361

    Publication date:

    2004-01-01

    Size:

    4 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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