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Lateral scaling challenges for SiGe NPN BiCMOS process integration
Lateral scaling challenges for SiGe NPN BiCMOS process integration
Lateral scaling challenges for SiGe NPN BiCMOS process integration
U'Ren, G. D. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 313-317
01.01.2005
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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