Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
A combinatorial analysis of deposition parameters and substrates on performance of mc-Si:H thin films by VHF-PECVD
A combinatorial analysis of deposition parameters and substrates on performance of mc-Si:H thin films by VHF-PECVD
A combinatorial analysis of deposition parameters and substrates on performance of mc-Si:H thin films by VHF-PECVD
Zhang, X. d. (Autor:in) / Zhao, Y. (Autor:in) / Zhu, F. (Autor:in) / Wei, C. c. (Autor:in) / Wu, C. y. (Autor:in) / Gao, Y. t. (Autor:in) / Sun, J. (Autor:in) / Hou, G. f. (Autor:in) / Geng, X. h. (Autor:in) / Xiong, S. z. (Autor:in)
APPLIED SURFACE SCIENCE ; 245 ; 1-5
01.01.2005
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Mechanical stress reduction in PECVD a-Si:H thin films
| British Library Online Contents | 1999
Nanostructural features of nc-Si:H thin films prepared by PECVD
| British Library Online Contents | 2004
Nanostructural and PL Features of nc-Si:H Thin Films Prepared by PECVD Techniques
| British Library Online Contents | 2004
Preparation of P-Type Microcrystal Si:H Films by ECR-PECVD
| British Library Online Contents | 2011
Batch Processing Method to Deposit a-Si:H Films by PECVD
| British Library Online Contents | 2004