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A combinatorial analysis of deposition parameters and substrates on performance of mc-Si:H thin films by VHF-PECVD
A combinatorial analysis of deposition parameters and substrates on performance of mc-Si:H thin films by VHF-PECVD
A combinatorial analysis of deposition parameters and substrates on performance of mc-Si:H thin films by VHF-PECVD
Zhang, X. d. (author) / Zhao, Y. (author) / Zhu, F. (author) / Wei, C. c. (author) / Wu, C. y. (author) / Gao, Y. t. (author) / Sun, J. (author) / Hou, G. f. (author) / Geng, X. h. (author) / Xiong, S. z. (author)
APPLIED SURFACE SCIENCE ; 245 ; 1-5
2005-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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