Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Prediction of Residual Stress Distribution in Multi-Stacked Thin Film by Curvature Measurement and Iterative FEA
Prediction of Residual Stress Distribution in Multi-Stacked Thin Film by Curvature Measurement and Iterative FEA
Prediction of Residual Stress Distribution in Multi-Stacked Thin Film by Curvature Measurement and Iterative FEA
Choi, H. C. (Autor:in) / Park, J.-H. (Autor:in)
JOURNAL OF MECHANICAL SCIENCE AND TECHNOLOGY ; 19 ; 1065-1071
01.01.2005
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Residual Stress Measurement of Porous Silicon Thin Film by Substrate Curvature Method
British Library Online Contents | 2006
|Surface Residual Stress Measurement Using Curvature Interferometry
British Library Online Contents | 2006
|X-ray Residual Stress Measurement on Mechanical Components with High Curvature
British Library Online Contents | 2003
|Assumptions in Thin Film Residual Stress Methods
British Library Online Contents | 2002
|Residual Stress Analysis of Epoxy Coating/Substrate System Using Curvature Measurement Method
British Library Online Contents | 2007
|