Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
High resolution quantitative SIMS analysis of shallow boron implants in silicon using a bevel and image approach
High resolution quantitative SIMS analysis of shallow boron implants in silicon using a bevel and image approach
High resolution quantitative SIMS analysis of shallow boron implants in silicon using a bevel and image approach
Fearn, S. (Autor:in) / McPhail, D. S. (Autor:in)
APPLIED SURFACE SCIENCE ; 252 ; 893-904
01.01.2005
12 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Accurate SIMS depth profiling for ultra-shallow implants using backside SIMS
British Library Online Contents | 2003
|Estimation of ultra-shallow implants using SIMS, NRA and chemical analysis
British Library Online Contents | 2003
|SIMS backside depth profiling of ultra shallow implants
British Library Online Contents | 2003
|Accurate depth profiling for ultra-shallow implants using backside-SIMS
British Library Online Contents | 2004
|Quantitative analysis of the top 5 nm of boron ultra-shallow implants
British Library Online Contents | 2003
|