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High resolution quantitative SIMS analysis of shallow boron implants in silicon using a bevel and image approach

Fearn, S. / McPhail, D. S.

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High resolution quantitative SIMS analysis of shallow boron implants in silicon using a bevel and image approach

Fearn, S. / McPhail, D. S.

High resolution quantitative SIMS analysis of shallow boron implants in silicon using a bevel and image approach

Fearn, S. / McPhail, D. S.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

High resolution quantitative SIMS analysis of shallow boron implants in silicon using a bevel and image approach

Contributors:

Fearn, S. (author) / McPhail, D. S. (author)

Published in:

APPLIED SURFACE SCIENCE ; 252 ; 893-904

Publication date:

2005-01-01

Size:

12 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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