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Interstitial injection during oxidation of very low energy nitrogen-implanted silicon
Interstitial injection during oxidation of very low energy nitrogen-implanted silicon
Interstitial injection during oxidation of very low energy nitrogen-implanted silicon
Skarlatos, D. (Autor:in) / Tsamis, C. (Autor:in) / Perego, M. (Autor:in) / Fanciulli, M. (Autor:in) / Tsoukalas, D. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 314-318
01.01.2005
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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