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Photo- and Electroluminescence of Hydrogenated Nanocrystalline Si Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Shim, J. H. / Cho, N. H.

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Photo- and Electroluminescence of Hydrogenated Nanocrystalline Si Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Shim, J. H. / Cho, N. H.

Photo- and Electroluminescence of Hydrogenated Nanocrystalline Si Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Shim, J. H. / Cho, N. H.

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Zugriff über TIB

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Bestellung bei Subito €

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Dokumentinformationen

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Titel:

Photo- and Electroluminescence of Hydrogenated Nanocrystalline Si Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Beteiligte:

Shim, J. H. (Autor:in) / Cho, N. H. (Autor:in) / Kim, H. S. / Li, Y. B. / Lee, S. W.

Erschienen in:

Eco-Materials Processing & Design VII: Proceedings of the Conference of the 7^t^h International Symposium on Eco-Materials Processing & Design January 8-11, 2006, Chengdu, China ; 958-961

MATERIALS SCIENCE FORUM ; 510/511

Erscheinungsdatum:

01.01.2006

Format / Umfang:

4 pages

ISSN:

0255-5476

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition

Iacona, F. / Ceriola, G. / La Via, F. | British Library Online Contents | 2001

Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

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