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Structural and photo-luminescence properties of nanocrystalline silicon films deposited at low temperature by plasma-enhanced chemical vapor deposition
Structural and photo-luminescence properties of nanocrystalline silicon films deposited at low temperature by plasma-enhanced chemical vapor deposition
Structural and photo-luminescence properties of nanocrystalline silicon films deposited at low temperature by plasma-enhanced chemical vapor deposition
Ali, A. M. (Autor:in) / Inokuma, T. (Autor:in) / Hasegawa, S. (Autor:in)
APPLIED SURFACE SCIENCE ; 253 ; 1198-1204
01.01.2006
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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