Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques: Fid-Bau Portal

Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Shim, J. H. / Cho, N. H. / Kim, Y. J. / Whang, C. M. / Cho, W. S. / Yoo, Y. C. / Kim, J. G. / Kwon, Y. J.

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Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Shim, J. H. / Cho, N. H. / Kim, Y. J. / Whang, C. M. / Cho, W. S. / Yoo, Y. C. / Kim, J. G. / Kwon, Y. J.

Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Shim, J. H. / Cho, N. H. / Kim, Y. J. / Whang, C. M. / Cho, W. S. / Yoo, Y. C. / Kim, J. G. / Kwon, Y. J.

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Titel:

Nanostructural and Optical Features of nc-Si:H Thin Films Prepared by Plasma Enhanced Chemical Vapor Deposition Techniques

Beteiligte:

Shim, J. H. (Autor:in) / Cho, N. H. (Autor:in) / Kim, Y. J. (Autor:in) / Whang, C. M. (Autor:in) / Cho, W. S. (Autor:in) / Yoo, Y. C. (Autor:in) / Kim, J. G. (Autor:in) / Kwon, Y. J. (Autor:in) / Kim, H. S. / Li, Y. B.

Erschienen in:

Eco-Materials Processing & Design VII: Proceedings of the Conference of the 7^t^h International Symposium on Eco-Materials Processing & Design January 8-11, 2006, Chengdu, China ; 962-965

MATERIALS SCIENCE FORUM ; 510/511

Erscheinungsdatum:

01.01.2006

Format / Umfang:

4 pages

ISSN:

0255-5476

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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The effects of argon and helium dilution in the growth of nc-Si:H thin films by plasma-enhanced chemical vapor deposition

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