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Elemental depth profiling of a-Si1-xGex:H films by elastic recoil detection analysis and secondary ion mass spectrometry
Elemental depth profiling of a-Si1-xGex:H films by elastic recoil detection analysis and secondary ion mass spectrometry
Elemental depth profiling of a-Si1-xGex:H films by elastic recoil detection analysis and secondary ion mass spectrometry
Mikami, A. (Autor:in) / Takagawa, T. (Autor:in) / Nishio, K. (Autor:in) / Ogawa, H. (Autor:in) / Okazawa, T. (Autor:in) / Kido, Y. (Autor:in)
APPLIED SURFACE SCIENCE ; 252 ; 5124-5130
01.01.2006
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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