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Elemental depth profiling of a-Si1-xGex:H films by elastic recoil detection analysis and secondary ion mass spectrometry
Elemental depth profiling of a-Si1-xGex:H films by elastic recoil detection analysis and secondary ion mass spectrometry
Elemental depth profiling of a-Si1-xGex:H films by elastic recoil detection analysis and secondary ion mass spectrometry
Mikami, A. (author) / Takagawa, T. (author) / Nishio, K. (author) / Ogawa, H. (author) / Okazawa, T. (author) / Kido, Y. (author)
APPLIED SURFACE SCIENCE ; 252 ; 5124-5130
2006-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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