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Round-robin study of arsenic implant dose measurement in silicon by SIMS
Round-robin study of arsenic implant dose measurement in silicon by SIMS
Round-robin study of arsenic implant dose measurement in silicon by SIMS
Simons, D. ( Autor:in ) / Kim, K. ( Autor:in ) / Benbalagh, R. ( Autor:in ) / Bennett, J. ( Autor:in ) / Chew, A. ( Autor:in ) / Gehre, D. ( Autor:in ) / Hasegawa, T. ( Autor:in ) / Hitzman, C. ( Autor:in ) / Ko, J. ( Autor:in ) / Lindstrom, R. ( Autor:in )
APPLIED SURFACE SCIENCE ; 252 ; 7232-7235
01.01.2006
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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