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Round-robin study of arsenic implant dose measurement in silicon by SIMS

Simons, D. / Kim, K. / Benbalagh, R. / Bennett, J. / Chew, A. / Gehre, D. / Hasegawa, T. / Hitzman, C. / Ko, J. / Lindstrom, R.

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Round-robin study of arsenic implant dose measurement in silicon by SIMS

Simons, D. / Kim, K. / Benbalagh, R. / Bennett, J. / Chew, A. / Gehre, D. / Hasegawa, T. / Hitzman, C. / Ko, J. / Lindstrom, R.

Round-robin study of arsenic implant dose measurement in silicon by SIMS

Simons, D. / Kim, K. / Benbalagh, R. / Bennett, J. / Chew, A. / Gehre, D. / Hasegawa, T. / Hitzman, C. / Ko, J. / Lindstrom, R.

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Document information

Title:

Round-robin study of arsenic implant dose measurement in silicon by SIMS

Contributors:

Simons, D. (author) / Kim, K. (author) / Benbalagh, R. (author) / Bennett, J. (author) / Chew, A. (author) / Gehre, D. (author) / Hasegawa, T. (author) / Hitzman, C. (author) / Ko, J. (author) / Lindstrom, R. (author)

Published in:

APPLIED SURFACE SCIENCE ; 252 ; 7232-7235

Publication date:

2006-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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