Surface reaction mechanism of Y2O3 atomic layer deposition on the hydroxylated Si(100)-2x1: A density functional theory study

Ren, J. / Zhou, G. / Hu, Y. et al. | British Library Online Contents | 2009

Silicon surface passivation using thin HfO2 films by atomic layer deposition

Gope, J. / Batra, N. / Panigrahi, J. et al. | British Library Online Contents | 2015

Surface reactions in atomic layer deposition of HfO2, ZrO2 and Al2O3 on hydroxylated and sulfur-passivated GaAs(100) surfaces: A comparative study by density functional theory

Ren, J. / Zhou, G. / Hu, Y. et al. | British Library Online Contents | 2008

Atomic layer deposition of CeO2/HfO2 gate dielectrics on Ge substrate

Maeng, W. J. / Oh, I. K. / Kim, W. H. et al. | British Library Online Contents | 2014

Effects of precursors on nucleation in atomic layer deposition of HfO2

Aarik, J. / Aidla, A. / Kikas, A. et al. | British Library Online Contents | 2004