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Mechanisms of stress generation within a polysilicon gate for nMOSFET performance enhancement
Mechanisms of stress generation within a polysilicon gate for nMOSFET performance enhancement
Mechanisms of stress generation within a polysilicon gate for nMOSFET performance enhancement
Morin, P. (Autor:in) / Ortolland, C. (Autor:in) / Mastromatteo, E. (Autor:in) / Chaton, C. (Autor:in) / Arnaud, F. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 135 ; 215-219
01.01.2006
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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