Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Annealing Behavior of N^+-Implantation-Induced Defects in SiC at Low Temperatures
Annealing Behavior of N^+-Implantation-Induced Defects in SiC at Low Temperatures
Annealing Behavior of N^+-Implantation-Induced Defects in SiC at Low Temperatures
Satoh, M. (Autor:in) / Suzuki, T. (Autor:in) / Miyagawa, S. (Autor:in) / Devaty, R. P. / Larkin, D. J. / Saddow, S. E.
01.01.2006
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Ion Implantation Induced Defects in 6H-SiC and their Annealing Behaviour
British Library Online Contents | 2001
|Formation of Extended Defects in 4H-SiC Induced by Ion Implantation/Annealing
British Library Online Contents | 2009
|Detection and Characterization of Defects Induced by Ion Implantation/Annealing Process in SiC
British Library Online Contents | 2009
|Self-implantation of Cz-Si: Clustering and annealing of defects
British Library Online Contents | 2006
|British Library Online Contents | 2003
|