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Detection and Characterization of Defects Induced by Ion Implantation/Annealing Process in SiC
Detection and Characterization of Defects Induced by Ion Implantation/Annealing Process in SiC
Detection and Characterization of Defects Induced by Ion Implantation/Annealing Process in SiC
Nagano, M. (Autor:in) / Tsuchida, H. (Autor:in) / Suzuki, T. (Autor:in) / Hatakeyama, T. (Autor:in) / Senzaki, J. (Autor:in) / Fukuda, K. (Autor:in)
MATERIALS SCIENCE FORUM ; 600/603 ; 611-614
01.01.2009
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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