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Formation of Extended Defects in 4H-SiC Induced by Ion Implantation/Annealing
Formation of Extended Defects in 4H-SiC Induced by Ion Implantation/Annealing
Formation of Extended Defects in 4H-SiC Induced by Ion Implantation/Annealing
Nagano, M. (Autor:in) / Tsuchida, H. (Autor:in) / Suzuki, T. (Autor:in) / Hatakeyama, T. (Autor:in) / Senzaki, J. (Autor:in) / Fukuda, K. (Autor:in)
MATERIALS SCIENCE FORUM ; 615/617 ; 477-480
01.01.2009
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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