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Effect of Reactive-Ion Etching on Thermal Oxide Properties on 4H-SiC
Effect of Reactive-Ion Etching on Thermal Oxide Properties on 4H-SiC
Effect of Reactive-Ion Etching on Thermal Oxide Properties on 4H-SiC
Matocha, K. S. (Autor:in) / Cowen, C. S. (Autor:in) / Beaupre, R. (Autor:in) / Tucker, J. B. (Autor:in) / Devaty, R. P. / Larkin, D. J. / Saddow, S. E.
01.01.2006
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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